发明名称 ELECTRON GUN STRUCTURE
摘要 PURPOSE:To facilitate the correction of the electron beam locus, by providing a pair of projected bead glass chips for holding the mutual interval of each electrode to surround the electron beam locus while magnetizing by the projected chip. CONSTITUTION:The electron gun 3 is comprised of a cathode 10, G1 electrode 11, G2 electrode 12, G3 electrode 13, G4 electrode 14 and a pair of bead glasses 15, 15 facing each other, where the cathode 10 and the electrodes 11-14 are planted in the glasses 15, 15 to hold the mutual interval. The glass 15 has the magnetizable performance while provided with a plurality of integrally projected chips 15a which are provided between the electrodes 13, 14 to surround the locus of the electron beams 4B, 4G, 4R. The glasses 15, 15 are magnetized by an external magnetizer to provide the field necessary for the correction of the shift of the beams 4B-4R into the locus. With such arrangement fine corrected field distribution can be obtained easily while the shift due to the vibration of the electron beam locus after correction can be prevented.
申请公布号 JPS58166628(A) 申请公布日期 1983.10.01
申请号 JP19820050621 申请日期 1982.03.26
申请人 MITSUBISHI DENKI KK 发明人 WATANABE TETSUYA
分类号 H01J29/50 主分类号 H01J29/50
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