| 摘要 |
Described herein is a combination film based on aluminium oxide (Al2O3) and titanium oxide (TiO2), to be used in particular in the thin film electroluminescent structures. Aluminum oxide is an amorphous insulator having a low refraction index, whereas titanium oxide is a chrystalline conductor having a high refraction index. The combination film according to the invention comprises a plurality of alternating aluminium oxide and titanium oxide layers having a thickness of 3 to 1000 ANGSTROM . preferably 5 to 250 ANGSTROM . Such a combination film has favorable dielectric strength and refraction index properties and is particularly adapted for use in electroluminescence structures. |
