| 摘要 |
PURPOSE:To maintain the accuracy of the position of a probe remarkably high by simultaneously forming by a photoetching method the shapes of all probe units. CONSTITUTION:An entire probe unit having hollow cavities 27-30, a holding part 24 surrounding the cavities and probes 21-23 held by the holding part is simultaneously formed by a photoetching method of a quartz plate. There are in the vicinity of the end of a probe tong piece 41 a stylus 42 to be actually contacted with the electrode of a semiconductor element and lead wirings 43 for externally producing an electric signal from the stylus, and the extended ends 210 of the wirings 43 are connected to an inspecting unit. The wirings 43 may also be formed by the photoetching method. The metallic stylus 42 is press-fitted into a hole formed at the tong piece 41 of quartz, and can be fixed with conductive adhesive. |
