| 摘要 |
PURPOSE:To carry out vacuum deposition at a low temp. and to save electric power for heating by evaporating VOCl2 or VCl4 in vacuum, blowing gaseous hydrogen to reduce the vapor, and depositing V on a substrate. CONSTITUTION:A crucible 1 holding VOCl2 or VCl4 2 in a vacuum vessel 8 is kept at about 300 deg.K with a heating and cooling mechanism 3 while evacuating the vessel 8. The VOCl2 is converted into vapor 4 by evaporation up to about 10 Torr. The VCl4 is converted into vapor 4 by evaporation up to about 1X10<-2> Torr. By blowing gaseous hydrogen through a nozzle 5 in the state, a reaction is caused between the gaseous hydrogen and the vapor 4 of the VOCl2 or VCl4 2 to produce V, and a deposited V film 7 is formed on a substrate 6. Thus, the unfavorable influence of radiant heat on the substrate 6 and the apparatus can be reduced. |
