| 摘要 |
PURPOSE:To discriminate patterns according to the difference of colors, and to simplify the alignment of the patterns by using titanium, chromium or the like as a barrier film and using copper, gold or the like as a plating foundation metallic film. CONSTITUTION:Metallic wiring 2 is formed onto a silicon substrate 1 through a vacuum deposition method, and a wiring protective film 3 is deposited. The wiring protective film is bored through selective etching, and an opening section 3A is formed. A barrier metal 4 consisting of titanium or chromium and a colored plating foundation metal 5 consisting of copper or gold are formed onto the whole surface, and a resist 6 is applied. The pattern formed by the stepped difference of the wiring protective film is discriminated and a mask is aligned, the plating foundation metal is etched, and an opening section 8 is formed. The metallic projected electrode 9 is grown through an electroplating method. |
