| 摘要 |
PURPOSE:To obtain electrodes of metallic films free from short circuiting, etc. by forming a metallic film over the entire surface of a panel substrate for liquid crystal elements, covering the film surface with an Au film, etching the Au film to required patterns, and etching the underlying metallic film then further etching the Au film again. CONSTITUTION:A transparent electrode 1 is provided on the surface of a panel substrate 2 for liquid crystal TVs, etc., whereafter a metallic film 5 of the 1st layer consisting of Cr, a Cr alloy or Ti, a metallic film 6 of the 2nd layer consisting of Ni or a Cu film, and an Au film 7 are formed successively over the entire surface. Photoresist patterns 8 are formed on the film 7. The Au film 7 is first etched, then the film 6 and the film 5 are etched successively with respective etching solns. The etching of the film 6 in this stage progresses abnormally at the interface with the film 7 and the film 7 overhangs. Thereupon, the film 7 is etched again, and after the overhangs are removed, the resist film 8 is removed. Then, the contact and short circuiting of the overhang parts of the film 7 with the adjacent electrodes 1 and consequent generation of defectives are prevented. |
