| 摘要 |
PURPOSE:To obtain an all-environment type photoconductive material superior in optical fatigue resistance and durability, by forming a specified photoconductive amorphous layer contg. Si as a main component on a substrate. CONSTITUTION:A photoconductive material 100 is obtained by forming on a substrate 101 a photoconductive amorphous layer 102 contg. Si as a main component, and H or halogen. The layer 102 consists of the first layer region 103, 1-10,000nm thick contg. O as a component, the second layer region 104, 3- 5,000nm thick, contg. an element of group V of the periodic table in a distribution of concn. C held at a constant concn. C1 in the (t) range of tB-t1, where tB is an interface position in contact with the substrate 101 side, and gradually decreasing from a concn. C2 to a concn. C3 in the (t) range of t1-tT, where tT is an interface position in contact with a layer region 105, as shown in the graph, and the region 106, 0.2-95mum thick not contg. O and the element of group V. |
