发明名称 HOLDER FOR HEATING THIN-FILM FORMING SUBSTRATE
摘要 PURPOSE:To obtain the holder for heating the thin-film forming substrate displaying an effect when forming a thin-film made of a sulfide by coating the surface to which the substrate must be fast stuck with a tantalum oxide thin-film. CONSTITUTION:The holder 4 is constituted in such a manner that a tantalum wire is arranged between stainless steel plates 1, 2 as a heater 3. Half the surface of the stainless steel plate 1 on the heating side is coated with the Ta2O3 thin-film 7. A ZnS film is formed through a sputtering method in order to investigate corrosion resistance to ZnS. When repeating sputtering operation, only the ZnS film becomes slightly opaque and no holder 4 changes on the side coated with the Ta2O5 thin-film 7, and etching and exfoliation are remarkable on the exposed surface side of the stainless steel plate 4. Attention need not be paid to a film forming device for an exfoliating holder metal impurity and contamination to the thin-film formed on the side coated with the Ta2O5 film.
申请公布号 JPS58159323(A) 申请公布日期 1983.09.21
申请号 JP19820043492 申请日期 1982.03.17
申请人 MATSUSHITA DENKI SANGYO KK 发明人 MATSUOKA TOMIZOU;FUJITA YOUSUKE;TOUDA TAKAO;NITSUTA KOUJI
分类号 C23C14/54;H01L21/203 主分类号 C23C14/54
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