发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PURPOSE:To enlarge the effective area and to increase element density by a circuit wherein passive elements or active elements are formed on the rugged surface. CONSTITUTION:Thick field oxide films 2, 2 locally projected on both sides and thick field oxide films 3, 3... are formed on the surface of a semiconductor substrate 1 of one conductive type. Then, the intermediate thick oxide films 3, 3... are removed leaving the field oxide films 2, 2 on both sides to produce the rugged surface in the substrate, on which a diffusion layer 4 of conductive type opposite to that of the substrate is formed as a lower electrode. Subsequently, a capacity insulating film 5 is formed on the lower electrode 4 except for the leading port of an electrode terminal 4a. Then, an upper electrode 6 made of a polycrystal silicon or metal is formed on the insulating film 5, and both electrode terminals 4a and 6a are led out from the lower and upper electrodes, respectively.
申请公布号 JPS58159344(A) 申请公布日期 1983.09.21
申请号 JP19820043145 申请日期 1982.03.18
申请人 NIPPON DENKI KK 发明人 MATSUMOTO KAZUNARI
分类号 H01L21/70;H01L21/822;H01L21/8234;H01L27/088;H01L29/78 主分类号 H01L21/70
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