发明名称 Thin-layer apparatus
摘要 The treatment wall (8), which is formed by the inner wall of a container (1), is formed by the circumferential surface of a straight truncated circular cone whose axis coincides with the container axis (A). The treating member (13) cooperating with this treatment wall (8) has a plurality of applicator elements (15) which are mounted on a shaft (14) which is moved up and down by a drive (19) in the direction of the container axis (8) in a translatory fashion. Each applicator element (15) has a working edge (16) which extends adjacent to the treatment wall (8) and forms a gap therewith. The working edges (16) of these applicator elements (15) extend along the circumferential surface (17) of a further straight truncated circular cone, which is co-axial with the truncated circular cone formed by the treatment wall (8). The aperture angle of these two truncated circular cones can be the same or different. The thin-layer apparatus is suitable for continuous heat treatment of various flowable materials. <IMAGE>
申请公布号 CH638302(A5) 申请公布日期 1983.09.15
申请号 CH19790004138 申请日期 1979.05.03
申请人 LUWA AG 发明人 JOHANN GRUETER;HEINZ MAERKI
分类号 B01D1/22;(IPC1-7):F28D3/04 主分类号 B01D1/22
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