| 发明名称 |
Magnetron cathode sputtering system. |
| 摘要 |
<p>By connecting in a magnetron cathode sputtering system the target (plate of material to be sputtered) 8 against the backing plate 13 by vacuum suction, the backing plate 13 may be used over and over again.
<??>By moreover providing the backing plate with a layer of soldering material which does adhere to the said backing plate 13 but does not adhere to the target 8, the heat transfer between the two plates can be improved. </p> |
| 申请公布号 |
EP0088463(A1) |
申请公布日期 |
1983.09.14 |
| 申请号 |
EP19830200273 |
申请日期 |
1983.02.23 |
| 申请人 |
N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
CROMBEEN, JACOBUS EDUARDUS;CROOYMANS, PETRUS WILHELMUS HENRICUS MARIA;VISSER, JAN |
| 分类号 |
C23C14/36;C23C14/34;C23C14/35;H01J37/34;H01L21/00;H01L21/683;(IPC1-7):01J37/34;23C15/00;01J37/20 |
主分类号 |
C23C14/36 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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