发明名称 Apparatus for performing solution growth relying on temperature difference technique.
摘要 <p>A solution growth apparatus for conducting an epitaxial growth of a compound semiconductor crystal from solution by relying on the temperature difference technique at a constant growth temperature and on a mass production scale without deranging the control of the growth temperature applied externally of the growth apparatus and with the application of only a small heating power and only a small cooling power, by enhancing the thermal exchange efficiency through the provision of heating means, via an insulator, for the melt-containing reservoir provided on the growth boat housed within a quartz reactor and by the provision of cooling means at the bottom of the boat within the reactor.</p>
申请公布号 EP0088579(A1) 申请公布日期 1983.09.14
申请号 EP19830301083 申请日期 1983.03.01
申请人 ZAIDAN HOJIN HANDOTAI KENKYU SHINKOKAI 发明人 NISHIZAWA, JUN-ICHI;OKUNO, YASUO
分类号 C30B19/08;H01L21/208;(IPC1-7):30B19/08 主分类号 C30B19/08
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