发明名称 |
MANUFACTURING A POLISHING ELEMENT |
摘要 |
In a method of making a polishing element a photoresist film 2 is first deposited on a surface of metal stock 1. A photomask 3 is then used to selectively cover portions of the deposited photoresist film 2. Thereafter, portions of the photoresist film 2 which are not covered by the photomask 3 are removed in order to leave exposed patterned portions 5 of the metal stock surface. Gulf-shaped recesses 6 are then etched into the exposed portions of the metal stock surface. The formation of gulf-shaped recesses 6 results from the application of a etchant while the metal stock 1 and the etchant are in physical motion relative to one another. After etching, remaining portions of the photoresist film 2 are removed from the metal stock. A polishing element 10 comprising cutting teeth 11 having acute cutting action angles results. |
申请公布号 |
GB2115322(A) |
申请公布日期 |
1983.09.07 |
申请号 |
GB19820036469 |
申请日期 |
1982.12.22 |
申请人 |
* NIPPON TENSHASHI KABUSHIKI KAISHA |
发明人 |
SACHIKO * IHATA |
分类号 |
B23D73/12;B23D43/00;B23D71/00;B23D73/04;B24B29/00;B24D18/00;B24D99/00;C23F1/00;C23F1/04;(IPC1-7):23P17/00 |
主分类号 |
B23D73/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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