发明名称 PHOTOMECHANICAL PROCESS
摘要 PURPOSE:To prevent the ground stain of a lithographic printing plate and to improve the sensitivity of the image part by applying an aqueous soln. contg. a specified condensed resin to the printing plate after development and by burning the printing plate. CONSTITUTION:A photosensitive lithographic printing plate is imagewise exposed and developed. An aqueous soln. contg. a condensed resin is then applied to the printing plate. After the soln. is dried, the printing plate is burned. The condensed resin is prepd. by condensing aromatic sulfonic acid or a salt thereof such as sodium benzenesulfonate with aldehyde such as formaldehyde. By this method, desensitization after burning can be eliminated and a lithographic printing plate having superior printing resistance is obtd. The non-image part of the printing plate is not stained and the image part has high sensitivity.
申请公布号 JPS62242945(A) 申请公布日期 1987.10.23
申请号 JP19860086500 申请日期 1986.04.15
申请人 FUJI PHOTO FILM CO LTD 发明人 TOYAMA TADAO;KUNICHIKA KENJI;MATSUMOTO HIROSHI
分类号 G03F7/26;G03F7/40;(IPC1-7):G03F7/00 主分类号 G03F7/26
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