| 摘要 |
PURPOSE:To prevent the deterioration of the color purity effectively by suppressing the abnormal hole extending phenomena and the occurrence of rimple on a substantially rectangular shadow mask paticularly at the effective section of the corner section thereby assuring the landing margin of the electron beam. CONSTITUTION:At the corner section of a substantially rectangular shadow mask 1, a through-hole 12 is provided from a portion of a non-effective section 3 which is continuous through an interface section 4 to the circumference of an effective section 2 having many electron beam holes to the folding section 6 and the skirt section 5. When providing such through-holes 12 correspondingly during flat masking, the tensile at the forming will be weakened due to the through-hole 12 when pressing the effective section 2 and the non-effective section simultaneously while holding the skirt section 5. Consequently the abnormal hole extention near the interface 4 can be suppressed effectively while the rimple due to the excessive material at the corner section is eliminated from the effective section. |
