| 摘要 |
PURPOSE:To enhance various characteristics of a photoconductive material sensitive to electromagnetic waves, by using a photoconductive layer composed of an amorphous material made mainly of Si and contg. at least one of H and halogen. CONSTITUTION:A photoconductive material 100 is composed of a substrate 101, an amorphous auxiliary layer 102 contg. Si as a main constituent, and N, a charge injection preventive layer 103 composed mainly of Si, and contg. an element of group V of the periodic table, the first amorphous layer 104 composed mainly of Si, and the second amorphous layer 105 contg. Si, C up to 30 atomic %, and H. It is tough in the amorphous layers and remarkably excellent in adhesion to the substrate, it can be used repeatedly and continuously for a long time at high speed, it has superior electrical, optical, and photoconductive characteristics, and good pressure resistance and use environment resistance, and when used for an electrophotographic image-forming material, it can form high- quality images stably and repeatedly. |
