| 摘要 |
PURPOSE:To obtain a colored pattern suitable for various kinds of photographing elements and a minute color separation filter for color display, by vapor depositing a dye image on a base contg. a specified resist mask and removing a resist mask. CONSTITUTION:A base 1 is coated with a positive type resist contg. fluorine- contg. methacrylate monomer units represented by the formula (R1, R2 are each H or alkyl, and R3 is alkyl each of its carbon is substd. by at least one F, dried, exposed to light in a prescribed pattern with electron beams or the like, and developed to form a resist mask 2. Then, a dye layer 3 is formed by vacuum vapor deposition. A first colored pattern 4 is obtained by immersing the layer 3 in a solvent for dissolving or stripping only the resist mask 2, and removing the mask 2 together with the dye layer 3 located on the mask 4. A colored pattern having plural colors is obtained by repeating said process and forming colored patterns 4, 5, and 6 likewise. |
