发明名称 METHOD FOR FORMING PROTECTING FILM BY PLASMA POLYMERIZATION
摘要 PURPOSE:To form a protecting film having excellent surface hardness and chemical resistance on the surface of a plastic, by carrying out the plasma polymerization of an aromatic compound to apply an undercoating to the surface, and then carrying out the plasma polymerization of a silicon compound to apply a top-coating thereto. CONSTITUTION:A protecting film is formed on the surface of a plastic (e.g. polymethyl methacrylate) by applying an undercoating to the surface by the plasma polymerization of an aromatic compound (e.g. benzene) using a plasma polymerization apparatus, and then applying a top-coating to the surface by the plasma polymerization of a silicon compound (e.g. tetramethoxysilane) in combination with one or more gases selected from oxygen, nitrogen, argon, ammonia, etc. The thickness of the undercoating and the top-coating layers are preferably 0.01-1mu and 1-10mu, respectively.
申请公布号 JPS58147431(A) 申请公布日期 1983.09.02
申请号 JP19820030175 申请日期 1982.02.26
申请人 NIHON ITA GLASS KK 发明人 MORITA SHINZOU;KAWAMURA HAJIME;ISHIBASHI SHINTAROU;TAKIGAWA AKIO;YOSHIDA MOTOAKI
分类号 C08J7/00;B05D7/24;C08J7/04 主分类号 C08J7/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利