| 摘要 |
A relief image is prepd. by (a) providing a substrate whose surface activates polymerisation of a monomer of formula CHR = CXY (I) (X, Y = strong electron withdrawing gps., and R = H, or, when X and Y are both CN, 1-4C alkyl), (b) treating the substrate surface with a photosensitive cpd. which releases an acid on exposure to active or ionising radiation; (c) imagewise exposing the substrate to release the acid; and (d) treating the substrate with vapours of monomer (I) to form a polymeric coating in the unexposed areas. An article, pref. a SiO2 coated Si wafer, carrying an image prepd-. as above is also claiied. |
