发明名称 METHOD FOR EXPOSING LIQUID PHOTOSENSITIVE RESIN
摘要 PURPOSE:To enable a long or wide product to be continuously formed without forming zebra phenomenon, by using a cover film or a base film in place of a negative film for exposure. CONSTITUTION:For example, a cover film 7 is made of a usual plastic film, and desirable letters or patterns are printed with a light-shading ink by a screen printing method, etc. An considerably wide cover film 7 independent of length, can be used by the screen printing method, etc. A photosensitive resin 5 held between a base film 1 and the cover film 7 is exposed to light from a light source 10 while horizontally conveyed. At that time, the film 7 and the resin 5 are in close contact with each other, and since there is no air layer between the 2 layers 7, 5, zebra phenomenon has no danger of occurrence, thus permitting continuous manufacture of long or wide products without causing zebra phenomenon.
申请公布号 JPS58143348(A) 申请公布日期 1983.08.25
申请号 JP19820024431 申请日期 1982.02.19
申请人 ASAHI KASEI KOGYO KK 发明人 KAMETANI SHINICHI
分类号 B29C35/08;B29C43/22;B29C43/28;G03F7/20 主分类号 B29C35/08
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