发明名称
摘要 A Schottky barrier semiconductor device comprising a semiconductor substrate having a hole in part of one of its main surfaces, a surface protecting film formed on the main surface and having a flange-like part extending over the edge of the hole, and a barrier metal formed on the entire wall of the hole including areas underneath the flange-like portion. The barrier metal film thus formed prevents concentration of an electric field at the edge of the interface between the barrier metal and the semiconductor substrate, thereby improving the reverse breakdown characteristics.
申请公布号 DE2649738(C2) 申请公布日期 1983.08.25
申请号 DE19762649738 申请日期 1976.10.29
申请人 MITSUBISHI DENKI K.K., TOKYO, JP 发明人 NARA, AIICHIRO;KONDO, HISAO;FUJIWARA, TAKEJI;IKEGAWA, HIDEAKI, AMAGASAKI, HYOGO, JP
分类号 H01L21/288;H01L29/41;H01L29/417;H01L29/47;H01L29/872;(IPC1-7):01L29/48;01L21/04;01L21/283;01L29/64 主分类号 H01L21/288
代理机构 代理人
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