| 摘要 |
PURPOSE:To obtain a laminate type photoconductive amosphous silicon member undergoing no deterioration even after repeated use, having superior durability and moisture resistance, and leaving no measurable residual potential, by forming the 2nd specified amorphous layer on the 1st photoconductive amorphous layer. CONSTITUTION:A photoconductive member 100 is manufactured by laminating an auxiliary layer 102 made of an Si atom-base amorphous material contg. <=25atomic% N atoms and H atoms as constituent atoms and a charge implantation preventing layer 103 made of an Si atom-base amorphous material contg. atoms of a III group element as constituent atoms on a support 101 in order and by forming the 1st photoconductive amorphous layer 104 made of an Si atom-base amorphous material contg. H atoms and/or halogen atoms as constituent atoms and the 2nd amorphous layer 105 made of an amorphous material contg. Si atoms, C atoms and halogen atoms as constituent atoms on the layer 103 in order. |
