| 摘要 |
PURPOSE:To manufacture a laminate type photoconductive amorphous silicon member undergoing no deterioration even after repeated use and having superior pressure resistance, by laminatong a specified auxiliary layer, a charge implantation preventing layer and a photoconductive amorphous layer on a support. CONSTITUTION:A photoconductive member 100 is manufactured by laminating an auxiliary layer 102 made of an Si atom-base amorphous material contg. halogen atoms and <=30atomic% N atoms as constituent atoms, a charge implantation preventing layer 103 made of an Si atom-base amorphous material contg. atoms of a III group element as constituent atoms, and a photoconductive amorphous layer 104 made of an Si atom-base amorphous material contg. H atoms and/or halogen atoms as constituent atoms on a support 101 in order. |
