发明名称 ARRANGEMENT WITH RADIATION WINDOW OR MASK STRUCTURE
摘要 <p>{PG,1 The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.</p>
申请公布号 DE2965853(D1) 申请公布日期 1983.08.18
申请号 DE19792965853 申请日期 1979.09.06
申请人 WESTERN ELECTRIC COMPANY, INCORPORATED 发明人 ADAMS, ARTHUR CURTIS;CAPIO, CESAR DEDUYO;LEVINSTEIN, HYMAN JOSEPH;SINHA, ASHOK KUMAR;WANG, DAVID NIN-KOU
分类号 G03F1/22;G21K5/02;H01L21/027;H01L21/30;(IPC1-7):03F1/00;01L21/72;21K1/10;01L21/00 主分类号 G03F1/22
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