| 摘要 |
PURPOSE:To form a photoconductive material superior in light fatigue resistance, good in durability and humidity resistance, and little in residual potential, by laminating a few kinds of specified amorphous silicon (a-Si) layers. CONSTITUTION:An a-Si layer is used consisting of the first layer region made of an a-Si contg. oxygen, and the second layer region 105 made of an a-Si contg. an element of the 3rd group, such as B, Al, or Ga, each having a part in common, located on the side of a conductive substrate 101, and they satisfy the equation and inequality as shown, where tB is thickness of the region 104, and T is the difference between thickness of the 2 regions. A photoconductive material is formed by laminating an auxiliary layer 102 made of an a-Si contg. nitrogen, said first amorphous layer 103, and the second amorphous layer 108 made of an a-Si contg. carbon and halogen on the conductive substrate 101. |
