发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a photosensitive composition having superior photosensitivity, giving an insolubilized photosensitive film with high adhesive strength to its substrate, and capable of forming a clear image by blending a dichromate with specified modified polyvinyl alcohol. CONSTITUTION:Modified polyvinyl alcohol contg. units represented by the formula (where R<1> is H or lower alkyl, and R<2> is alkyl) is blended with a dichromate such as ammonium dichromate. The modified polyvinyl alcohol includes a saponification product of a copolymer of N-methoxymethylamide with vinyl acetate. The product contains about 0.01-20mol% said units and about 60- 100mol% saponification degree. The polymn. degree of the copolymer is about 100-6,000.
申请公布号 JPS58137833(A) 申请公布日期 1983.08.16
申请号 JP19820020037 申请日期 1982.02.09
申请人 KURARAY KK 发明人 MORIYA TOUHEI;YAMAUCHI JIYUNNOSUKE;SHIRAISHI MAKOTO
分类号 G03C1/66;G03F7/04 主分类号 G03C1/66
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