发明名称 Polyoxazole precursor and the preparation thereof
摘要 The invention relates to oligomeric and/or polymeric precursor stages of polyoxazoles, as well as to a method for the preparation of these precursor stages. New radiation-reactive polymer precursor stages are provided comprised of addition products of olefinically unsaturated monoepoxides on hydroxyl group-containing polycondensation products of aromatic and/or heterocyclic dihydroxy diamino compounds with dicarboxylic-acid chlorides or esters. The radiation-reactive precursor stages according to the invention are suitable, for example, for the preparation of highly heat-resistant relief structures and as coatings for the optical fibers of light waveguides.
申请公布号 US4398009(A) 申请公布日期 1983.08.09
申请号 US19800179462 申请日期 1980.08.19
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 AHNE, HELLMUT;KUEHN, EBERHARD;RUBNER, ROLAND
分类号 G02B6/44;C07C67/00;C07C231/00;C07C231/02;C07C231/12;C07C233/35;C07C233/43;C07C233/75;C07C233/78;C08G69/26;C08G69/32;C08G73/00;C08G73/02;C08G73/22;G03F7/027;G03F7/038;(IPC1-7):C08G65/40 主分类号 G02B6/44
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