发明名称 |
Polyoxazole precursor and the preparation thereof |
摘要 |
The invention relates to oligomeric and/or polymeric precursor stages of polyoxazoles, as well as to a method for the preparation of these precursor stages. New radiation-reactive polymer precursor stages are provided comprised of addition products of olefinically unsaturated monoepoxides on hydroxyl group-containing polycondensation products of aromatic and/or heterocyclic dihydroxy diamino compounds with dicarboxylic-acid chlorides or esters. The radiation-reactive precursor stages according to the invention are suitable, for example, for the preparation of highly heat-resistant relief structures and as coatings for the optical fibers of light waveguides.
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申请公布号 |
US4398009(A) |
申请公布日期 |
1983.08.09 |
申请号 |
US19800179462 |
申请日期 |
1980.08.19 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
AHNE, HELLMUT;KUEHN, EBERHARD;RUBNER, ROLAND |
分类号 |
G02B6/44;C07C67/00;C07C231/00;C07C231/02;C07C231/12;C07C233/35;C07C233/43;C07C233/75;C07C233/78;C08G69/26;C08G69/32;C08G73/00;C08G73/02;C08G73/22;G03F7/027;G03F7/038;(IPC1-7):C08G65/40 |
主分类号 |
G02B6/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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