| 摘要 |
PURPOSE:To produce photosensitive films uniformly in large amts. in unit time by discharging electricity in evacuated film forming chambers to form radicals from glass contg. Si using the stages of feeding substrates into the film forming chambers through fore waiting chambers, conveying the same along conveying paths and feeding the same to discharging paths through post waiting chambers. CONSTITUTION:In the stage of forming photosensitive drums by forming films of alpha-Si on the outside circumferential surfaces of drum-like substrates 64, film forming chambers 40 are set to maintain always a film formable state, and the substrates 64 are introduced into the chambers 40 through small fore waiting chambers 42. The operation of introducing the fresh substrates 64 is completed simultaneously with the formation of films. The drums formed with the films are discharged from the chambers 40 through small post waiting chambers 44. The chambers 42, 44 are set at the small size to accommodate one piece of the substrate 64. The time necessary for forming a vacuum state is reduced and the substrates rotate to form the photosensitive layers having a specified thickness. |
