| 摘要 |
PURPOSE:To manufacture a reflected-light reproduction type hologram easily by coating a metallic thin film formed as a reflecting layer on a transparent substrate as a base with a compound which sets by electron beam irradiation, and irradiating from the substrate side with electron beams while a relief hologram metallic mold surface is brought into contacted with the substrate. CONSTITUTION:A metallic thin film 1b of Al, etc., vapor-deposited on the substrate such as glass and a high polymer film is coated with the compound 2 which sets by electron beam irradiation and the pattern surface of the relief hologram metallic mold 3 is brought into contacted with the substrate to irradiate the substrate with electron beams 4. This thin film 1b is formed to a 200-20,000Angstrom thickness to transmit electron beams and to set the layer 2. After the setting, the metallic mold 3 is removed, and consequently reflected-light reproduction type relief holograms with a fine pattern are mass-reproduced easily at low cost and in a relatively short time. |
