发明名称 OPERATING PART FOR HEAT TREATING FURNACE
摘要 PURPOSE:To simplify the insertion of a semiconductor wafer or the like into a heat treating furnace having a jig operating part as well as the drawing out of the wafer therefrom and the operation inside the furnace, by mounting a lid part at an opening formed at one end of the furnace. CONSTITUTION:A furnace body 1 is provided at one end opening thereof with a lid part 2 for closing the opening. A handle 12 and a pressure relief pipe 13 are attached to the outside of the lid part 2. A jig operating rod 5 and a thermocouple 7 are attached to the inside of the lid part 2. Accordingly, by removing the lid part 2 from one end of the furnace, the operating rod 5 and the thermocouple 7 can be simultaneously drawn out from the inside of the furnace. On the other hand, by mounting the lid part 2 at the opening at one end of the furnace, the operating rod and the thermocouple can be simultaneously inserted into the inside of the furnace. In a heat treatment, with a semiconductor wafer 14 supported by a treating jig 6, the jig 6 is inserted into the inside of the furnace by means of the operating rod 5. At the same time when the operating rod 5 is inserted into the inner part of the furnace, the opening at one end of the furnace is closed.
申请公布号 JPS58130520(A) 申请公布日期 1983.08.04
申请号 JP19820226154 申请日期 1982.12.24
申请人 HITACHI SEISAKUSHO KK 发明人 ISHII SEIICHI;USHIKI FUMIO;NAGANO YUUJIROU
分类号 H01L21/205;H01L21/00;H01L21/22 主分类号 H01L21/205
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