发明名称 FORMATION OF AMORPHOUS SEMICONDUCTOR
摘要 PURPOSE:To extremely improve the characteristics of a solar cell using an amorphous semiconductor film by previously treating the surface of a substrate by irradiating with ultraviolet rays in a hydrogen atmosphere. CONSTITUTION:A substrate coated with a transparent conductive film is washed in a washing room 1 and sent to a drying room 2. The substrate 10 brought in a previous treatment room 3 after washing and drying is held on a holder 23 and heated by a heater 24. Simultaneously, a hydrogen gas is introduced from a hydrogen gas supply inlet 15 and the inside of the previous treatment room 3 is kept with a hydrogen atmosphere. Then, ultraviolet rays 26 are irradiated from a mercury lamp 21 via a window 22 on the surface of the substrate. Continuously, the substrate is brought in a film forming room 4 of amorphous semiconductor and a p-type amorphous film 33, an amorphous semiconductor (i) film 34 and an N film 35 are formed on the substrate 10 and at last, a solar cell is formed by adding a metal electrode 36. By an extremely simple previous treatment of irradiating the ultraviolet rays in the hydrogen atmosphere, the characteristics of the amorphous semiconductor solar cell can greatly be improved.
申请公布号 JPS62266823(A) 申请公布日期 1987.11.19
申请号 JP19860110365 申请日期 1986.05.14
申请人 FUJI ELECTRIC CORP RES & DEV LTD 发明人 IHARA TAKURO;ICHIKAWA YUKIMI
分类号 H01L21/205;H01L21/263;H01L31/04 主分类号 H01L21/205
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