发明名称 HIGH FREQUENCY SEMICONDUCTOR UNIT
摘要 High-frequency semiconductor unit comprises an insulator substrate (3) provide on a metal substrate (1) with mounting holes (2) and defining a central hole in which is mounted a circuit substrate (4) carrying at least one semiconductor element. Independent metallised layers are provided on the insulator substrate (3) and around the circuit substrate (4), these layers including, e.g. hf signal input layers (5) located centrally and extending to the outside of the insulator layer (3), four DC circuit layers (6) disposed generally symmetrically about the hf input layers (5), and electrodes (7,7') at ends of the DC layers (6). An insulating frame (6) is provided on the insulator substrate (3), around and projecting above the hole accommodating the circuit substrate (4), and a hermetic seal element is provided over the frame (8).
申请公布号 EP0020787(B1) 申请公布日期 1983.08.03
申请号 EP19800900085 申请日期 1980.07.14
申请人 FUJITSU LIMITED 发明人 YAMAMURA, SHIGEYUKI;KOSEMURA, KINJIRO;SHIMA, TAKAO;HIDAKA, NORIO;FUKUTA, MASUMI;TAKEUCHI, YUKIHIRO;SHIMOJI, YUTAKA
分类号 H01L23/047;H01L23/057;H01L23/66;H01L25/16;(IPC1-7):01L23/12 主分类号 H01L23/047
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