| 摘要 |
PURPOSE:To provide the titled working chamber applicable to a large scaled manufacture line such as semiconductor manufacturing process by coverong only the manufacturing line in a tunnel shape by use of an air purification unit and a partition plate, and locally purifying the same by sectioning it from the surrounding protected zone. CONSTITUTION:A unit A and a unit B constituting the air purifying device are connected by a partition plate 31 to form a continuous tunnel shaped cover. By operating a blower 17, the unit 14 sucks up air from the surrounding protected zone 33 through a pre-filter 20, and purifies air sent out from the blower 17 by a high performance filter 16 to blow off air from a pure air blow-off port 21 into a working part 32a in the room. Further, the unit B26 applies pressure to air supplied from an air supply duct 7 for air conditioning by a blower 28, and purifies the air by a high performance filter 27 to blow off the air from the pure air blow-off port 29 into the passage 32b within the chamber. In this manner, it is possible to set the purification degree of the most essential working part 32a, at a value higher than the purification degree of the passage 32b. |
