| 发明名称 |
PLASMA PASSIVATION TECHNIQUE FOR THE PREVENTION OF POST ETCH CORROSION OF PLASMA-ETCHED ALUMINUM FILMS |
| 摘要 |
<p>F-1466 PLASMA PASSIVATION TECHNIQUE FOR THE PREVENTION OF POST-ETCH CORROSION OF PLASMA-ETCHED ALUMINUM FILMS By Christopher H. Galfo and Ashok L. Nalamwar A method for preventing the post-etch corrosion of aluminum or aluminum alloy film which has been etched utilizing chlorinated plasma wherein the etched film is exposed to flourinated plasma.</p> |
| 申请公布号 |
CA1151106(A) |
申请公布日期 |
1983.08.02 |
| 申请号 |
CA19810373924 |
申请日期 |
1981.03.26 |
| 申请人 |
FAIRCHILD CAMERA AND INSTRUMENT CORPORATION |
发明人 |
GALFO, CHRISTOPHER H.;NALAMWAR, ASHOK L. |
| 分类号 |
C23F4/00;C23F11/00;H01L21/02;H01L21/302;H01L21/3065;H01L21/3213;(IPC1-7):B23P1/00;C23C13/04 |
主分类号 |
C23F4/00 |
| 代理机构 |
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