| 摘要 |
<p>PURPOSE:To obtain a thermal head without causing the variation of resistance value in response to the positioning accuracy of a mask by such an arrangement wherein the separation of resistors and the drilling of many holes on the resistors are carried out by using the same mask and photolithographic technique. CONSTITUTION:At first, on a substrate, a resistor layer and an electric conduction layer thereon are formed, and after that, small sections corresponding to the electric conduction layers 7 are removed by using a mask and photolithographic technique, and then beltlike sections corresponding to the electric conduction layers 8 are removed by using the mask. Next, by using the mask, the separation of resistors and the drilling of many holes in the resistors are simultaneously carried out by photolithographic technique. As the separation of resistors and the drilling of many holes in the resistors are performed by using the same mask, the sides L, M of the heat generating element in the direction of its electrode and gaps D3, D4 between sides and the holes 12 are constant in all thermal heads and there is no variation between lods and the yield of products is considerably raised.</p> |
