发明名称 WAFER INVERTING APPARATUS
摘要 PURPOSE:To invert a wafer in a vacuum device, by a method wherein a torsion spring is provided on a rotary support shaft of a jig, with one end of the spring secured to a fixed plate and the other to a movable plate, and the spring is wound by the movement of the movable plate to rotate the rotary support shaft. CONSTITUTION:A semi-annular chuck 2 has a leaf spring 4 in the circumferential direction and pawls 3, 5 on the inside thereof to clamp a wafer 1. A support shaft is provided with coils 9-11 constituting a series spring 8, one end of which is secured to a driving arm 12, the other end of which is secured to the chuck 2. When the arm 18 is rotated by a motor 20, a planetary 6 and the arm 12 are rotated in one body. The planetary 6 is engaged with a groove in a rail 24 to perform rotation and revolution for uniformly subjecting wafers to evaporation by means of electron beams. The motor 20 is suspended at the position where a plate 28 of a driving device 27 engages with a collar 14, and the plate 28 and the collar 14 are pushed down. By the movement of the arm 12, the chuck 2 is rotated through the torsion spring 8 to invert the wafer 1. The chuck 2 abuts against a stopper 31 of the planetary 6 and stops after a 180 deg. rotation. This constitution permits the wafer to be reliably inverted in a vacuum, so that the evaporation productivity is improved.
申请公布号 JPS58128724(A) 申请公布日期 1983.08.01
申请号 JP19820010003 申请日期 1982.01.27
申请人 HITACHI SEISAKUSHO KK 发明人 MITA TOORU
分类号 C23C14/50;H01L21/203;H01L21/285;H01L21/31;H01L21/67 主分类号 C23C14/50
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