| 摘要 |
PURPOSE:To suitably perform the treating capacity for an exposure machine by providing two sets of developing units, thereby obtaining the treating capacity of approx. twice by adding only a space of one set of the developing unit and adding similarly the developing unit. CONSTITUTION:A carrier which contains a wafer 3 is set to a supply elevator 17, 2 wafers 3 are respectively continuously automatically conveyed via waver conveying mechanisms 14, 15 and are respectively adsorbed to vacuum chucks 2, 9. The 2 wafers 3 are simultaneously developed by developing nozzles 4, 10 and cleaning nozzles 5, 11. After the development is completed, the wafers 3 are automatically conveyed and contained to the carrier which is set to a containing elevator 18 by the conveying mechanisms 15, 16. |
