| 摘要 |
PURPOSE:To enhance the vacuum depositing efficiency by placing an evaporating source on an axis of symmetry between two symmetrically arranged rolls for supporting substrates which undergo vacuum deposition so as to enable vacuum deposition on the substrates. CONSTITUTION:Substrates 7, 8 which undergo vacuum deposition move in directions A, B along rolls 1, 2 for supporting the substrates arranged in a vacuum vessel so that the outsides of the rolls face each other and become symmetrical with respect to an axis. An evaporating source 3 is placed on the axis of symmetry between the rolls 1, 2 or at a position close to the axis, and vacuum deposition is carried out using the source 3. The source 3 is heated by irradiating an electron beam 4. Thus, the vacuum depositing efficiency is enhanced. |
