| 摘要 |
PURPOSE:To obtain a positive-positive type photosensitive material superior in mechanical strength and resistance to chemicals, by compounding a specified compd., a cresol-novolak resin, a (meth)acrylic acid copolymer, and a styrene copolymer. CONSTITUTION:A photosensitive layer is formed on a support in 1-100mum thickness by compounding (A) 10-50wt% 2-diazo-1-naphthol-4-(and/or -5-)sulfonic acid novolak ester; (B) 15-70wt% cresol-novolak resin; (C) 10-40wt%, 50,000- 500,000mol.wt. (meth)acrylic acid type copolymer having formulaI(R1 is H or methyl; R2 is benzyl optionally substd. at the phenyl ring, or tert- or iso-butyl; R3 is lower alkyl; and m1>m2 and (m1+m2)/m3=1-20); and (D) 10-40wt%, 1,500-100,000mol.wt. styrene type copolymer having formula II (Ar is optionally substd. phenyl; R4 is lower alkyl; and n1>=n2) so as to give B/(C+D)=0.8-3.5. |
