| 摘要 |
PURPOSE:To improve the yield of products by quantitatively monitoring the state of the surface of a metallic film so that light irradiating time is set dynamically. CONSTITUTION:The intensity of reflected light detected by a photodetector 8 is made correspond to the lot number of a wafer or number given at every one wafer, and memorized to a memory means 9. The wafer passing through a load- lock 4 is encased into a cassette again by a wafer encasing mechanism 10, and coated with a resist 22. A mask 23 is formed onto the resist in order to pattern the metallic film 21, and beams 24 are irradiated selectively onto the resist 22 in an exposing section 11. In this case, the lot number or the wafer number is detected and access is executed to the memory means 9, and the intensity information of reflected light corresponding to the number is read. The information is given to a light irradiating time setting means 12, and irradiating time is determined. |
