| 摘要 |
PURPOSE:To reduce an error in position alignment by using a first alignment mark and a second alignment mark prepared of this mark for alignment of position of a mask. CONSTITUTION:By using a mask for forming a first marker, a first alignment mark 11 is formed on a substrate 41 whereon a PLZT thin film 44 is formed by sputtering. Next, a first layer pattern (waveguide) mask 12 and the mark 11 are aligned in position with each other, a resist 13 is exposed and developed by using the mask 12, and an aluminum pattern 11A is formed. Then, Ta2O5 24 being a material of a waveguide is sputtered, a waveguide pattern 24B is formed by removing the resist 13, and simultaneously a second alignment mark being transparent is formed by using the aluminum pattern 11A. Subsequently, direct position alignment is performed by means of the mark 11A to be a second marker and of a a third marker of a mask for forming a second layer pattern, and the second layer pattern to be an electrode is formed. |
