| 摘要 |
<p>Case 790315 CLEAR AQUEOUS DEVELOPERS FOR PHOTOPOLYMER LITHOGRAPHIC PLATES A single-phase, non-emulsion aqueous solution subtractive developer for lithographic plates having photopolymer coatings is provided. These clear developers are aqueous solutions including an active or primary solvent which is only partially soluble in water and which is a good solvent for the photopolymer of a lithographic plate that has not been exposed to and insolublized by actinic radiation, this active solvent typically being present at a concentration near its water solubility limit. Preferably, a cosolvent is also included to increase the water solubility of the active solvent when necessary. A desensitizer may be included to impart to the formulation the properties of a one-step developer or of a finisher, the desensitizer being a hydrophilic synthetic resin. Formulation and development methods for these developers are also included, and they may be used either as developers or as a machine developer solution replenisher.</p> |
