| 摘要 |
PURPOSE:To form a pattern edge into a linear shape even with use of an EB mask which is drawn electronically by means of an electronic exposure device, by forming a detection pattern only with a pattern of 45 deg. direction. CONSTITUTION:A detection pattern 5 of a thick film magnetic bubble detector using a magneto-resistance effect is formed only with a pattern of 45 deg. direction. Therefore an EB mask is used for the linear parts in the axial direction and 45 deg. direction to avoid a zigzag shape for the edge part of a pattern. Thus a pattern 5 having a reduced loss of the detection output can be formed in a simple way. |
