发明名称 X-RAY EXPOSURE EQUIPMENT
摘要 PURPOSE:To prevent the influence of secondary electrons which causes problems in the case of pattern transfer applying X-rays, and improve the accuracy of pattern transfer, by arranging a mirror reflecting all the X-rays with the same angle between an X-ray source and a light receiving surface. CONSTITUTION:When a 2-dimensional plane X-Y wherein an X-ray source 1 is situated at the origin is considered, an X-ray 3 radiated from the light source is expressed by y=ax((a) is a constant). Writing a mirror 2 as y=f(x) the intersection 4 of the mirror 2 and the X-ray 3 is given by a point x0 which satisfies ax0=f(x0). Then the tangent of reflection angle can be written as {f'(x0)-a}/{a+af'(x0)} which must be constant for all values of (a). Letting this value be (c), f'(x0)={f(x0)+cx0}/{x-cf(x0)} is derived from the two equations above. The function f (x) is obtained by solving the above differential equation, and the mirror may be manufactured according to the function. A 3-dimensional mirror 2 can be constituted by rotating this shape arround a center axis (y).
申请公布号 JPS62274716(A) 申请公布日期 1987.11.28
申请号 JP19860117275 申请日期 1986.05.23
申请人 HITACHI LTD 发明人 HAYATA YASUNARI;MOCHIJI KOZO;KIMURA TAKESHI
分类号 G21K1/06;G03F7/20;G21K5/02;H01L21/027 主分类号 G21K1/06
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