发明名称 CONNECTING METHOD FOR SEMICONDUCTOR ELEMENT
摘要 <p>PURPOSE:To perform a connection which does not cause breakdown nor shortcircuit by forming a window at a photoresist film on the electrode connecting part of a semiconductor element to an external circuit substrate and coating conductive paste on the window. CONSTITUTION:The end face of a semiconducor element 1 is closely contacted with that of an external circuit substrate 2 which is made of a multilayer ceramic substrate, electrodes 5, 4 of both are positioned, and are bonded fixedly on a base 6. Then, a photoresist film 11 is formed over the entire surfaces of the semiconductor element 1 and the substrate 2, and windows 12 are formed on the electrodes 4, 5. Then, conductive paste 3 is coated and cured on the widows 12, and the film 1 is exfoliated. In this manner, the electrode 5 of the element 1 can be commected to the electrode conductor 4 of the substrate 2 without improper connection.</p>
申请公布号 JPS58116744(A) 申请公布日期 1983.07.12
申请号 JP19810212872 申请日期 1981.12.29
申请人 MATSUSHITA DENKI SANGYO KK 发明人 TOYODA RIYUUICHI;MIZUTANI TAKESHI;KAWADA KOUICHI
分类号 H01L21/60;(IPC1-7):01L21/60 主分类号 H01L21/60
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