发明名称 CHARGE BEAM EXPOSING METHOD AND APPARATUS THEREFOR
摘要 PURPOSE:To keep small an amount of stored data by dividing a chip pattern into the common regin and identification code region, exposing the common region based on chip pattern data and by exposing the identification code region based on the identification code data. CONSTITUTION:Many chip patterns 2 are regularly arranged. An intrinsic identification code, for example, a chip number 3 is depicted within this chip pattern 2. The chip pattern is divided, for example, into the fields 4-1, 4-2..., 4-25 of 2mm. square in the charge beam exposing apparatus. On the occasion of exposing, after one field is exposed, a wafer 1 is moved only by 2mm. and then the next field is exposed. The depicting location of identification code such as a chip number is determined by the field location. For example, the identification code is depicted in the field 4-3. Thus, the identification code region is exposed on the basis of the identification code data.
申请公布号 JPS58116732(A) 申请公布日期 1983.07.12
申请号 JP19810213409 申请日期 1981.12.29
申请人 FUJITSU KK 发明人 NAKAYAMA NORIAKI;KOSEMURA KINSHIROU;YAMASHITA YOSHIMI
分类号 H01L21/027;H01J37/317;(IPC1-7):01L21/30 主分类号 H01L21/027
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