发明名称 Microwave plasma ion source
摘要 A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.
申请公布号 US4393333(A) 申请公布日期 1983.07.12
申请号 US19800215064 申请日期 1980.12.10
申请人 HITACHI, LTD. 发明人 SAKUDO, NORIYUKI;TOKIGUCHI, KATSUMI;KOIKE, HIDEMI;KANOMATA, ICHIRO;NAKASHIMA, HUMIHIKO
分类号 H01J27/18;H01J37/08;(IPC1-7):H01J7/24;H05B31/26 主分类号 H01J27/18
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