发明名称 |
Microwave plasma ion source |
摘要 |
A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.
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申请公布号 |
US4393333(A) |
申请公布日期 |
1983.07.12 |
申请号 |
US19800215064 |
申请日期 |
1980.12.10 |
申请人 |
HITACHI, LTD. |
发明人 |
SAKUDO, NORIYUKI;TOKIGUCHI, KATSUMI;KOIKE, HIDEMI;KANOMATA, ICHIRO;NAKASHIMA, HUMIHIKO |
分类号 |
H01J27/18;H01J37/08;(IPC1-7):H01J7/24;H05B31/26 |
主分类号 |
H01J27/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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