| 摘要 |
This invention is in concern of a method of and a device for adjusting a shaped-electron-beam working device which includes means for deflecting a shaped electron beam in the target plane and means for varying the shaped, preferably rectangular electron beam. The working device is adjusted with respect to the adjustment categories pupil, format or shape, and with respect to format calibration. The adjustment operations are performed substantially without any back-effects upon already obtained adjusted positions so that considerably short adjustment times are obtained. The inventional adjustment method provides a definite adjustment sequence for correcting aberrations visualized via display means, and also provides the device for performing the necessary steps. The invention is employed preferably in lithographic devices for producing microcircuits.
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