发明名称 PHOTOSENSITIVE COMPOSITION USED FOR LITHOGRAPHIC PLATE
摘要 PURPOSE:To enhance sensitivity, oil sensitivity, and developability by using a water-insoluble polymer having alcoholic hydroxyl groups and a water-insoluble diazo photosensitive material as main components. CONSTITUTION:Some of glycidyl esters or glycidyl ethers are additionally reacted with the phenolic hydroxyl groups of polyhydroxystyrene or its derivative, such as halogenated polyhydroxystyrene or nitrated polyhydroxystyrene to obtain a water-insoluble polymer having alcoholic hydroxyl groups on the side chains. This polymer and a water-insoluble diazo photosensitive material are used for the main components of a photosensitive compsn.
申请公布号 JPS58115434(A) 申请公布日期 1983.07.09
申请号 JP19810215103 申请日期 1981.12.28
申请人 FUJI YAKUHIN KOGYO KK 发明人 TOMITA CHIAKI;ASANO TAKATERU
分类号 G03F7/016;G03F7/021 主分类号 G03F7/016
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