发明名称 CLEANING OF GLASS
摘要 <p>PURPOSE:To obtain a glass mask for patten printing use, free from attached contaminants, in high yield, by immersing the glass to be cleaned in an acid such as sulfuric acid, and subjecting the glass to the conventional water-washing, alcohol washing, vapor cleaning, and antistatic treatment. CONSTITUTION:A glass mask to be cleaned is immersed in hot concentrated sulfuric acid or mixed acid at about 50-110 deg.C for about 5-10min (10), and drained thoroughly. The mask is then washed with water (1A) e.g. by immersing in water, etc., and washed with alcohol (2) e.g. by immersion, etc. The next vapor cleaning process (3) is carried out by contacting freon vapor to the surface of the glass mask to effect the condensation of the freon to the whole surface of the mask, and evaporating and drying the condensed freon. An antistatic treatment (4) is applied to the surface of the glass mask.</p>
申请公布号 JPS58115044(A) 申请公布日期 1983.07.08
申请号 JP19810210034 申请日期 1981.12.28
申请人 WATANABE SHIYOUKOU:KK 发明人 UMEDA MASARU;IDA SUSUMU;YATABE YASUO
分类号 C03C23/00;C11D7/00;G03F1/40;G03F1/82;H01L21/304;H01L21/308 主分类号 C03C23/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利